The FHD deposition system is designed to deposit silicon on the substrate and silicate (silica) on the substrate in the shortest possible time, and is particularly suitable for silica deposition in the optical waveguide process, with a film thickness of more than 25 microns.

Craft size : 6\8 "compatible,11pcs

Deposition velocity:1μm/ min Equipment configuration: raw material bin, reaction bin, waste gas treatment unit Film thickness :10μm-25μm

optical communication wafer coating